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DOC/BIS | RIN: 0694-AI46 | Publication ID: Spring 2021 |
Title: ●Export Controls for Certain Semiconductor Items: Lithography--Extreme Ultraviolet (EUV) Masks, Reticles, and Pellicles | |
Abstract:
The Bureau of Industry and Security (BIS) maintains, as part of its Export Administration Regulations (EAR), the Commerce Control List (CCL), which identifies certain items subject to Department of Commerce jurisdiction. Pursuant to the Export Control Reform Act of 2018, BIS and its interagency partners are engaged in a process to identify emerging and foundational technologies that are essential to the national security of the United States. Emerging technologies essential to the national security are those that may warrant stricter controls if present or potential application or capability of that technology poses a national security threat to the United States. This rule proposes to revise the CCL to control extreme ultraviolet (EUV) masks, reticles, and pellicles as emerging technology. |
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Agency: Department of Commerce(DOC) | Priority: Substantive, Nonsignificant |
RIN Status: First time published in the Unified Agenda | Agenda Stage of Rulemaking: Proposed Rule Stage |
Major: Undetermined | Unfunded Mandates: No |
CFR Citation: 15 CFR 774 | |
Legal Authority: 50 U.S.C. 4801 to 4852 50 U.S.C. 4601 50 U.S.C. 1701 10 U.S.C. 8720 10 U.S.C. 8730(e) ... |
Legal Deadline:
None |
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Timetable:
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Regulatory Flexibility Analysis Required: No | Government Levels Affected: None |
Federalism: No | |
Included in the Regulatory Plan: No | |
International Impacts: This regulatory action will be likely to have international trade and investment effects, or otherwise be of international interest. | |
RIN Data Printed in the FR: No | |
Agency Contact: Sharron Cook Policy Analyst Department of Commerce Bureau of Industry and Security 2096/MS 2705, 14th Street and Pennsylvania Avenue NW, Washington, DC 20230 Phone:202 482-2440 Email: sharron.cook@bis.doc.gov |