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DOC/BIS RIN: 0694-AI46 Publication ID: Spring 2021 
Title: ●Export Controls for Certain Semiconductor Items: Lithography--Extreme Ultraviolet (EUV) Masks, Reticles, and Pellicles 
Abstract:

The Bureau of Industry and Security (BIS) maintains, as part of its Export Administration Regulations (EAR), the Commerce Control List (CCL), which identifies certain items subject to Department of Commerce jurisdiction.  Pursuant to the Export Control Reform Act of 2018, BIS and its interagency partners are engaged in a process to identify emerging and foundational technologies that are essential to the national security of the United States.  Emerging technologies essential to the national security are those that may warrant stricter controls if present or potential application or capability of that technology poses a national security threat to the United States.  This rule proposes to revise the CCL to control extreme ultraviolet (EUV) masks, reticles, and pellicles as emerging technology.

 
Agency: Department of Commerce(DOC)  Priority: Substantive, Nonsignificant 
RIN Status: First time published in the Unified Agenda Agenda Stage of Rulemaking: Proposed Rule Stage 
Major: Undetermined  Unfunded Mandates: No 
CFR Citation: 15 CFR 774   
Legal Authority: 50 U.S.C. 4801 to 4852    50 U.S.C. 4601    50 U.S.C. 1701    10 U.S.C. 8720    10 U.S.C. 8730(e)    ...   
Legal Deadline:  None
Timetable:
Action Date FR Cite
NPRM  05/00/2021 
Regulatory Flexibility Analysis Required: No  Government Levels Affected: None 
Federalism: No 
Included in the Regulatory Plan: No 
International Impacts: This regulatory action will be likely to have international trade and investment effects, or otherwise be of international interest.
RIN Data Printed in the FR: No 
Agency Contact:
Sharron Cook
Department of Commerce
Bureau of Industry and Security
2096/MS 2705, 14th Street and Pennsylvania Avenue NW,
Washington, DC 20230
Phone:202 482-2440
Email: sharron.cook@bis.doc.gov